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Lucida S series ALD (new concept ALD system)
Applications • High-k Dielectrics : Al2O3, HfO2, ZrO2, TiO2, SrTiO3 …… • 300mm wafers • 100nm to ≤45nm devices
Benefits • Applications for High throughput (>56wfs/hr)
Features • ALD ultra-thin high-k dielectric with good thickness uniformity and conformal step coverage • Advanced process kit • Extremely materialize ALD Mechanism • Small foot print • Totally Integrated process module |
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