
|
Lucida G series RTCVD
Applications • Large area growth of Graphene • >150mm wafers
Benefits • Applications of R&D. • Very low price • Digital control of deposition parameters • Control of heating and cooling time • Control of gas saturation time • Control of layer by layer (ALD mode)
Features • High purity graphene growth •
Advanced process kit and small volume chamber • Small foot print(950X700mm) • Totally integrated process module • Easy process control with Delphi software
Graphene growth in 6" Ni/Si wafer by Lucida™ G series |
|
|
|
|
Copyright 2008 NCD CO. All Rights Reserved. |