Semiconductor

Lucida S series

Solar Cell

Lucida GS series

Display

Lucida GD series

R & D

Lucida D series

Lucida M series

Lucida C series

Lucida G series

Lucida P series

 

Lucida G series RTCVD

 

Applications

Large area growth of Graphene

• >150mm wafers

 

Benefits

• Applications of R&D.

• Very low price

• Digital control of deposition parameters

• Control of heating and cooling time

• Control of gas saturation time

• Control of layer by layer (ALD mode)

 

Features

• High purity graphene growth

• Advanced process kit and small volume chamber
for short gas pulse time

• Small foot print(950X700mm)

• Totally integrated process module

• Easy process control with Delphi software

  

Graphene growth in 6" Ni/Si wafer by Lucida™ G series

 

 

 Lucida G series

 Technical specifications

 Substrate size

 >150 mm wafer

 Sub. temperature

 25 ~ 1050

 Source gas

 CH4, H2, C2H6, CO2, Benzene….

 Foot print

 950 x 700 mm

 Compatibility

 Clean room class100

 Software

 Delphi-PC

 Optional

 High Vaccum pump(TMP)

 

 

 

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