Applications

• High-k Dielectrics

: Al2O3, HfO2, ZrO2, TiO2 ……

• 100~200mm wafers

• 100nm to ≤45nm devices

Benefits

• Applications of R&D.

• Very low price

• Various additional option

Features

• ALD ultra-thin high-k dielectric with good

 thickness uniformity and 100% conformal step

 coverage

• Advanced process kit and small-volume

 chamber for Short cycle times

• Extremely materialize ALD Mechanism

(Traveling wave Method)

• Small foot print(950X700mm)

• Totally Integrated process module

• Easy process control with Delphi software

• Minimize gas supply line length