Semiconductor

Lucida S series

Solar Cell

Lucida GS series

Display

Lucida GD series

R & D

Lucida D series

Lucida M series

Lucida C series

Lucida G series

Lucida P series

Lucida C series MOCVD

Applications

• Oxide, Metal, Metal nitride

• 100~200mm wafers

• 100nm to ≤45nm devices

Benefits

• Applications of R&D.

• Very low price

• Various additional option

Features

• MOCVD thin oxide, metal and metal nitride

with good thickness uniformity

• Advanced process kit and small-volume

Chamber

• Direct plasma system(optional)

• Small foot print(1000X700mm)

• Totally Integrated process module

• Easy process control with Delphi software

• Minimize gas supply line length