New concept high throughput ALD system |
Applications |
- Ultra thin films for semiconductor applications
: Al2O3, HfO2, ZrO2, TiO2, SrTiO3 ……
- 300mm wafers
- Applications for high throughput
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Features |
- ALD ultra-thin film with good thickness uniformity and
conformal step coverage
- Advanced ALD process kit
- Extremely materialize ALD mechanism
- Small foot print
- Totally integrated process module
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