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  • Lucida™ S series ALD

LucidaTM S series ALD

New concept high throughput ALD system

Applications

  • Ultra thin films for semiconductor applications
    : Al2O2, HfO2, ZrO2, TiO2 , SrTiO3 ……
  • 300mm wafers
  • Applications for high throughput

Features

  • ALD ultra-thin film with good thickness uniformity and conformal step coverage
  • Advanced ALD process kit
  • Extremely materialized ALD mechanism
  • Small foot print
  • Totally integrated process module
More information for application and specification for Lucida™ S series