[chinese] Technology reports 8 페이지 | 엔씨디

Global Leader in ALD Technology

  • 메인
  • 公司技术
  • 技术报告书


No File SIZE
17 Il-Kwon Oh et al., Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition, Chem. Mater., 2015, 27 (1), pp 148–156
16 So-Yeong Naa and Sung-Min Yoon, Reliability enhancement in thin film transistors using Hf and Al co-incorporated ZnO active channels deposited by atomic-layer-deposition, RSC Adv., 2018,8, 34215-34223
15 Kyung-Mun Kang, Yong-June Choi, Geun Young Yeom, and Hyung-Ho Park, Thickness-dependent growth orientation of F-doped ZnO films formed by atomic layer deposition, Journal of Vacuum Science & Technology A 34, 01A144 (2016)
14 Sung-Gyu Park et al., Fabrication of Au-Decorated 3D ZnO Nanostructures as Recyclable SERS Substrates, SENSORS, 2014 IEEE, 2-5 Nov. 2014, 1930-0395
13 J. Park et al., The growth behavior and properties of atomic layer deposited zinc oxide films using hydrogen peroxide (H2O2) and ozone (O3) oxidants, Ceramics International Volume 41, Issue 1, Part B, January 2015, Pages 1839-1845
12 Kwang-Dae Kim et al., Enhanced Stability of Organic Photovoltaics by Additional ZnO Layers on Rippled ZnO Electron-collecting Layer using Atomic Layer Deposition, Bull. Korean Chem. Soc. 2014, Vol. 35, No. 2 353
11 Yanghui Liu, Liqiang Zhu, Liqiang Guo, Hongliang Zhang, Hui Xiao, Surface Passivation Performance of Atomic-Layer-Deposited Al2O3 on p-type Silicon Substrates, J. Mater. Sci. Technol., 2014, 30(8), 835-838
10 Do-Joong Lee et al., Ultrasmooth, High Electron Mobility Amorphous In−Zn−O Films Grown by Atomic Layer Deposition, J. Phys. Chem. C 2014, 118, 408−415
9 Tae-Hoon Jung et al., Controlled growth and properties of p-type cuprous oxide films byplasma-enhanced atomic layer deposition at low temperature, Applied Surface Science 285P (2013) 373–379
8 J. Vac. Sci. Technol. A 31(1), JanFeb 2013, Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition