[chinese] Technology reports 1 페이지

Global Leader in ALD Technology

公司技术
技术报告书

技术报告书

게시판
No	File	SIZE
86	NCD’s ALD technology and equipment for oxidation barrier of copper based substrates	(1.1M)(911.6K)
85	Papers using NCD Equipment (Attached file)	(27.3K)
84	Soumyadeep Sinha et al., Revealing the Simultaneous Effects of Conductivity and Amorphous Nature of Atomic-Layer-Deposited Double-Anion-Based Zinc Oxysulfide as Superior Anodes in Na-Ion Batteries, Small 2019, 1900595
83	Il-Kwon Oh et al., Surface Energy Change of Atomic-Scale Metal Oxide Thin Films by Phase Transformation, ACS Nano 2020, 14, 676−687
82	Mohd Zahid Ansari et al., Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices, ACS Appl. Mater. Interfaces 2019, 11, 43608−43621
81	Eungjun Kim et al. & Seunghyup Yoo, Design of ultrathin OLEDs having oxide-based transparent electrodes and encapsulation with sub-mm bending radius, Organic Electronics 82 (2020) 105704
80	Sunbin Hwang et al., Chip on a ber toward the e-textile computing platform, Research Square, 10.21203@rs.3.rs-85927@v1
79	Dip K. Nandi et al. Soo-Hyun Kim, Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery, Electrochimica Acta 322 (2019) 134766
78	Sangbong Lee et al., Effect of the Bilayer Period of Atomic Layer Deposition on the Growth Behavior and Electrical Properties of the Amorphous In–Zn–O Film, ACS Appl. Mater. Interfaces 2020, 12, 35, 39372–39380
77	Yue Wang, Kyung-Mun Kang, Minjae Kim, Hyung-Ho Park, Film thickness effect in c-axis oxygen vacancy-passivated ZnO prepared via atomic layer deposition by using H2O2, Applied Surface Science Volume 529, 1 November 2020, 147095